This Conference Series is the premier world meeting for the presentation of the latest advances in all aspects of ion implantation, from the fundamentals of ion-solid interactions to manufacturing applications of the latest machines and systems. IIT is held every two years hosted in Europe, USA and Asia. IIT-2006 will be the 16thconference in this series.
The conference will cover a wide range of topics including Doping Processes, Implant Technology, Materials Science, Process Control and Yield and Novel Applications. Ultra Shallow Junctions will be a major feature covering recent advances, including Cluster Beams and Plasma Immersion. There will also be a discussion session, which will address the needs of IC manufacturers and a response from the OEM's. The conference program will consist of invited and oral presentations and poster sessions. For the duration of the conference there will be a Trade Exhibition featuring Ion Implantation equipment and service.
The Conference will be preceded by a School featuring Ion Implantation Science and Technology.